Chemistry pumping unit PC 201 NT
For evacuation, evaporation and pumping of gases and vapors in chemical, biological and pharmaceutical laboratories. The manual flow control valve regulates the effective pumping speed at the vacuum connection and the vacuum manometer offers an analog vacuum display. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The exhaust waste vapor condenser enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceGood ultimate vacuum even with gas ballastOilfree
Chemistry Pumping Unit PC 3001 VARIO® select with condenser Peltronic®
The PC 3001 VARIO® select pumping unit precisely controls the vacuum level in order to achieve unparalleled process control. This pump is suitable for even high boiling point solvents. The integrated VACUU·SELECT controller provides an easy-to-use, application based interface that covers all common lab applications. The pump's variable motor speed responds to demand, reducing energy waste and mechanical wear, ensuring unrivalled service life for the diaphragms.For solvent evaporation, the controller detects solvent boiling and automatically adjusts the pump's motor speed to maintain process controlUser-defined applications with simple drag-and-drop editing.Small footprint and low weight for flexible use in the laboratoryThe inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets from entering the pumpThe included emission condenser Peltronic® works without any cooling media like water or dry ice.Scope of supply: Chemistry pumping unit PC 3001 VARIO® select completely mounted with conderser Peltronic®, ready for use, with manual.Without mains cable, please order separately.
Chemistry pumping unit PC 510 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeThis pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfree
Chemistry pumping unit PC 511 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeA second, manually controlled vacuum port permits simultaneous operation of a second vacuum application on the same pump
Chemistry pumping unit PC 520 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeFor simultaneous operation of two independent applications with electronic vacuum control
Chemistry pumping unit PC 610 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeThis pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfree
Chemistry pumping unit PC 611 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeA second, manually controlled vacuum port permits simultaneous operation of a second vacuum application on the same pump
Chemistry pumping unit PC 620 select
This pumping unit offers a proven concept for vacuum generation and control for many evaporation processes. The inlet separator, made of glass with a robust protective coating, prevents particles and liquid droplets. The exhaust vapor condenser allows for nearly complete recovery of solvents.VACUU·SELECT vacuum controller with graphical user interfacePredefined applications save time and give reproducible resultsEasy-to-use application editor allows own process sequencesGood chemical and condensate compatibilityOilfreeFor simultaneous operation of two independent applications with electronic vacuum control
Chemistry pumping units VARIO® select PC 3001
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3002
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3003
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3004
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3010 NT
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3012 NT
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry pumping units VARIO® select PC 3016 NT
The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.The combination of speed controlled VARIO® chemistry diaphragm pumps and the new VACUU·SELECT vacuum controller makes the VARIO® select chemistry pumps the ideal solution for chemical processes that require precise vacuum, such as rotary evaporation, vacuum drying or vacuum concentration.High chemical resistance and therefore ideally suited for pumping aggressive gases and vapoursShort process times and smooth running due to optimal setting of the pressure via the VACUU·SELECT controllerThe VARIO® technology controls the vacuum precisely and efficiently via motor speedPower consumption, maintenance and noise are exceptionally lowThe outlet catchpot and solvent condenser combine to prevent solvent vapor emissions into the lab, allowing for nearly full recovery of solventsCountry-specific power cord versions available on request.
Chemistry vacuum system MD 12C NT EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeA separator at the inlet (AK) can be mounted later to this systemThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeA separator at the inlet (AK) can be mounted later to this system
Chemistry vacuum system ME 8C NT 2AK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The separator at the outlet collects condensate and avoids condensate backflow towards the pump.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeInlet and outlet separatorThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The separator at the outlet collects condensate and avoids condensate backflow towards the pump.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeInlet and outlet separator
Chemistry vacuum system MV 10C NT EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeA separator at the inlet (AK) can be mounted later to this systemThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeA separator at the inlet (AK) can be mounted later to this system
Chemistry vacuum system MZ 2C NT 2AK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The separator at the outlet collects condensate and avoids condensate backflow towards the pump.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeInlet and outlet separatorThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The separator at the outlet collects condensate and avoids condensate backflow towards the pump.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeInlet and outlet separator
Chemistry vacuum system MZ 2C NT AK/M/D
For evacuation, evaporation and pumping of gases and vapors in chemical, biological and pharmaceutical laboratories where there are no requirements for condensation of solvent vapors at the outlet. The manual flow control valve regulates the effective pumping speed at the vacuum connection, the vacuum manometer offers an analog vacuum display. This system is well proven for filtration. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationManual vacuum controlAnalog vacuum displayOilfree
Chemistry vacuum system, MD 12C NT AK/EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfree
Chemistry vacuum system, MD 1C AK/EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfree
Chemistry vacuum system, MD 4C NT AK SYNCHRO/EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeSimultaneous operation of two independent vacuum applications, with reliable check valves to prevent interference between systems
Chemistry vacuum system, MD 4C NT AK/EK
This chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfreeThis chemistry vacuum system has a wide range of applications like evacuation, evaporation and pumping of gases and vapors. The separator at the inlet (AK), made of glass with a protective coating, retains particles and liquid droplets. The waste vapor condenser at the outlet (EK) enables near 100 percent solvent recovery.Good chemical resistance and vapor toleranceHigh performance even at low vacuumGood vacuum even with gas ballastQuiet and ultra low vibrationOilfree